Generation-F On-Site Fluorine Generators
Reducing cleaning times and environmental impact for the display and semiconductor sectors with many years of unrivalled experience in the safe and reliable generation and delivery of fluorine
Our Generation-F® fluorine generators provide on-site production of cleaning gas for thermal furnace process, plasma-enhanced and thermal CVD tool dry-chamber cleaning. Fluorine is the ideal replacement for fluorine-bearing gases such as NF3, ClF3, SF6 and F2/N2 mixtures where inactive components can compromise cleaning performance.
Ultra-pure fluorine gas delivered from Generation-F systems offers the highest cleaning performance, shorter cleaning time, productivity gains relative to CVD tools, and reduced energy consumption and environmental impact thanks to zero Global Warming Potential (GWP).
In demanding thin-film procceses, fluorine can maintain steady chamber temperatures during the cleaning process, allowing a fast return to stable deposition processing.
The Generation-F series comes in a modular design capable of meeting all flow, concentration and volume requirements ranging from one ton to hundreds of tons each year So whether you operate a single tool or a large-scale fab, we have the solution for you. Benefits and highlights of Generation-F on-site generators include:
- Improved productivity thanks to faster cleaning at steady temperatures
- Sustainable alternative to high-GWP gases nitrogen trifluoride (NF3) and sulfur hexafluoride (SF6) for CVD chamber cleaning
- On-demand production, which means a very low real-time inventory and delivery pressure
Currently, more than 30 Generation-F systems are installed worldwide.
